PVD for LED Technology
In the fabrication of blue, green and UV LEDs, the deposition of both an AlN buffer layer and an ITO (indium tin oxide) current spread layer via sputtering is crucial to maximizing light output. NAURA Akrion’s iTops PVD (physical vapor deposition) systems (iTops A230 for AlN & iTops i233 Plus for ITO) offer LED manufacturers the ability to sputter these films in a cost-effective manner with the highest yield.
A light-emitting diode (LED) is a semiconductor light source that emits light when current flows through it. From the first low-intensity infrared LEDs used in remote control circuits, LEDs can now emit a wide variety of light colors with extreme efficiency and lifespans, serving a multitude of applications to include architectural/industrial/residential lighting, automotive head/tail lights, traffic signals, mobile/tablet/computer/TV displays, horticultural lamps and medical devices. The emerging mini/micro LED technology will serve as the cornerstone of next-generation display technology for products such as mobile phones, wearable watches, virtual/augmented reality, micro-projectors and ultrahigh-definition TVs.
iTops A230 AlN Sputter System
iTops A230 Aluminum Nitride Sputter System deposits a high crystalline AlN buffer layer with excellent thickness uniformity on sapphire substrates for the production of blue, green and UV LED devices. The higher vacuum and temperature capabilities produce superior AlN films.
iTops i233 Plus ITO Sputter System
The iTops i233 Plus ITO Sputtering System deposits a high crystalline, uniform ITO film with excellent electrical conductivity and high visible light transmission.