PVD for Digital IC Technology

NAURA Akrion offers an expandable set of PVD (physical vapor deposition) tools that deposit a wide variety of metal and oxide target materials with excellent film quality including through silicon via structures. The Polaris and eVictor products offer optional degas and preclean chambers along with the PVD modules and can accommodate up to 10 process modules in the dual transfer module, eVictor platform.

The Digital IC (integrated circuit) market, largely composed of the largest IC manufacturers of memory, microprocessor, logic and foundry companies, is recognized as one of the most technically challenging markets in microelectronics. Modeled by the traditional “Moore’s Law”, Digital IC manufacturers are constantly pushing the limits in reducing feature size to new limits by introducing new device structures, novel materials and new methods.

eVictor GX20 Physical Vapor Deposition System

 eVictor GX20 for Physical Vapor Deposition

eVictor GX20 for Physical Vapor Deposition

eVictor GX20 is a fully automated general PVD sputtering system that supports a wide variety of applications and material in a high capacity platform. It has a flexible chamber configuration around dual transfer modules and can be configured with up to ten modules.

POLARIS G620 Physical Vapor Deposition System

 POLARIS G620 Physical Vapor Deposition System

POLARIS G620 Physical Vapor Deposition System

Polaris G620 is a fully automated general PVD sputtering system that supports a wide variety of applications and materials. It has a flexible chamber configuration around a single transfer module and can be configured with up to six modules.