GAMA Automated Wet Station

 GAMA Automated Wet Station

GAMA Automated Wet Station

System Overview
The GAMA Series automated wet station is a flexible, modular system suitable for a wide variety of cleaning, etching and stripping applications for bare & reclaimed silicon wafers, IC devices, MEMS and photomasks.

 

Substrate Size:150 mm, 200 mm, 300 mm
Applicable material: Silicon, Glass
Technology Markets:Analog IC, Power IC, MEMS, R&D
Processes
  • Pre-Diffusion Clean
  • Nitride Etch
  • Photoresist Strip
  • Post Ash/Etch Clean
  • Advanced Front End of Line Clean
  • Pre-Epitaxial Clean
  • Cu Clean / Low-k
  • Cobalt Silicide Clean
  • Silicon Post Polish Clean
  • Silicon Final Clean
  • Surface/Bulk Micromachining
  • Post DRIE Clean
Production Advantages
  • Batch immersion process solution for all FEOL and BEOL semiconductor applications
  • Can process 300 mm and 200 mm wafers concurrently
  • Performance proven platform
  • Modular design, highly flexible, customizable to meet any process flow and throughput requirement
  • Concentration control and dilute chemistry for low cost of ownership
  • Space saving, multi-process tool configurations
  • Advanced megasonic cleaning technology
  • Multiple lot / multiple recipe processing
  • Full SECS GEM interface