ClearIQ Mask Cleaning System
System Overview
ClearIQ is a batch immersion reticle cleaning tool that removes organic contaminants, particles, and free ionic residues and haze. It uses a patented sulfuric megasonics technique that minimizes the degree of etching and roughening of the mask. The cleaning technique includes the use of megasonics to SOM (sulfuric acid/ozone mixture) to enhance the stripping efficiency and applies megasonics to SC1 enabling an optimal balance between particle removal efficiency and optical property changes.
Processes
- Cleaning Binary and Advanced Photomasks
Production Advantages
- Exceptional particle removal efficiency
- Consistently low ionic contamination levels
- Minimal optical property changes
- Suitable for binary and PSM Technologies
- Flexibility through modular design
- Proven high reliability
- SMIF Compatible
- High throughput capability
- Optional chemistries: Solvents & HF etch
- Able to perform photoresist stripping and surface cleaning
- Small tanks to minimize water and chemical consumption
- DIO3 intentionally configured to reduce sulfate residue after SPM (or SOM)