ClearIQ Mask Cleaning System
System Overview
ClearIQ is a batch immersion reticle cleaning tool that removes organic contaminants, particles, and free ionic residues and haze. It uses a patented sulfuric megasonics technique that minimizes the degree of etching and roughening of the mask. The cleaning technique includes the use of megasonics to SOM (sulfuric acid/ozone mixture) to enhance the stripping efficiency and applies megasonics to SC1 enabling an optimal balance between particle removal efficiency and optical property changes.
ClearIQ Mask Cleaning Tool for Binary and Advanced Photomasks
Photomasks in ClearIQ Carrier
Substrate Size:
Applicable material:
Technology Markets:
Typical 152mm x 152mm x 6.35mm (6” x 6” x ¼”)
Photomask
Offline Tool for Mask Cleaning
Processes
- Cleaning Binary and Advanced Photomasks
Production Advantages
- Exceptional particle removal efficiency
- Consistently low ionic contamination levels
- Minimal optical property changes
- Suitable for binary and PSM Technologies
- Flexibility through modular design
- Proven high reliability
- SMIF Compatible
- High throughput capability
- Optional chemistries: Solvents & HF etch
- Able to perform photoresist stripping and surface cleaning
- Small tanks to minimize water and chemical consumption
- DIO3 intentionally configured to reduce sulfate residue after SPM (or SOM)