Batch Immersion for Digital IC Technology

NAURA Akrion’s newest cassetteless batch immersion wet stations, the Pinnacle 200 & Pinnacle 300, offer Digital IC customers the next level of efficiency in wet etch and clean processes. The combination of tank designs, in-situ process control, circulation/filtration system and robotics ensures Digital IC IDMs of having a process tool that will enable them to push the technology limits both today and in the future.

The Digital IC (integrated circuit) market, largely composed of the largest IC manufacturers of memory, microprocessor, logic and foundry companies, is recognized as one of the most technically challenging markets in microelectronics. Modeled by the traditional “Moore’s Law”, Digital IC manufacturers are constantly pushing the limits in reducing feature size to new limits by introducing new device structures, novel materials and new methods.

 

Pinnacle 200 Batch Immersion System

 PINNACLE® 200 Carrierless Wet Station

PINNACLE® 200 Carrierless Wet Station

Designed for the most cutting-edge devices, the fully-automated, carrierless PINNACLE batch immersion wet stations utilize the most advanced wafer handling and process control subsystems to ensure the optimum process results for manufacturers of digital integrated circuits.

Pinnacle 300 Batch Immersion System

 PINNACLE® 300 Carrierless Wet Station

PINNACLE® 300 Carrierless Wet Station