PSG Etch & Clean


NAURA Akrion PSG etch & clean application is used to remove the deposited phosphosilicate glass from the wafer to prepare it for AR nitride deposition.

Acidic solution removes the deposited phosphosilicate glass (PSG) to prepare the wafer for AR nitride deposition.
Alkaline Clean
Alkaline solution removes contaminates from the wafer surface that were added during previous steps. These contaminants, if not removed, can affect the passivation of the surface and the resultant quality of the aluminum paste that can be applied.
Acidic solution removes the oxide grown on the wafers during the clean up step. Prepares a clean surface before AR deposition.
Top View Drawing process station for multicrystalline wafers
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Additional Solar Applications:

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